應樂小雲教授邀請黃久齊博士來我院做學術報告，歡迎廣大教師、同學積極參加。

題 目：Thin Film Deposition Techniques and Their Applications-Microelectronics, Optoelectronics, Flat Panel Display and Solar Energy

時 間：2009年12月1日，上午11：00

地 點：教學區主樓主513

報 告 人：黃久齊 博士

報告摘要：

Thin film deposition technology is a fundamental block for many technologies, such as microelectronics, optoelectronics, flat panel display, solar energy and fuel cells. It is used in microelectronics for metallization, gate dielectrics and many other dielectrics layers; in optoelectronics for forming waveguide, modulators, laser and LED; in flat panel display for Liquid Crystal on Silicon (LCOS), a-Si TFT-LCD, low temperature polysilicon LCD, TFT-LCD array; in solar energy for both amorphous Si photovoltalic panel and crystalline Si photovoltalic panel; and fuel cells for both electrolyte and electrodes. The presentation will give a broad overview of various thin film deposition techniques – Chemical Vapor Deposition (CVD, Epitaxial CVD, MOCVD, PECVD, SACVD, LPCVD), Physical Vapor Deposition (PVD-Sputtering, RF PVD, reactive sputtering, e-beam evaporation), Atomic Layer Deposition and ion beam deposition. This presentation will also review advantages and limitations for various thin film deposition technical and their applications in microelectronics and optoelectronics.

報告人簡介：

黃久齊，中國科技大學物理系學士（1986），中國科學院物理所碩士（1989），美國賓夕法尼亞大學工程博士（1996）；1996年至2009年，先後在美國MEMC Electronics Materials擔任工程專家, 美國朗訊科技公司(Lucent Technologies)擔任技術參謀成員, 美國國際商業機器公司(IBM)擔任顧問工程師和經理。在高溫超導體材料和能源電池快離子導體材料研究開發方面取得了顯著成果；曾獲哥倫比亞商學院院長獎, IBM’s Bravado獎, Philips’ Star Award, Lucent/Agere’s Recognition Award, 和美國賓夕法尼亞大學Fellowship &Scholarship；共發表論文20多篇。